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            Spin Developer (LT-SS SD)

         시스템 특장점

            Stand Alone Type
            Manual Loading & Auto Process
            Wafer, Glass, Ceramic 공정에 적합
            Chemical Dispense용 Scan Arm
            Spin Developer, Spin Etching, Spin Cleaning 공정
            5000rpm의 회전 (Option : 7,000rpm)
            PC & 15" Monitor / PLC & 7" Touch Panel
            다양한 Dispense 방식 (Nozzle type)
            다양한 형태의 Spin Chuck 제작

적용 분야

            학교, 연구소, 기업체 연구. 제품 생산용
            반도체, LED, MEMS, Probe Card 제품 생산용
            Wafer, Glass, Mask, Ceramic등의 Developer공정

시스템 Specification

   Spin Coater
      - LT-MS Series
      - LT-MS CB
      - LT-MS DC
      - LT-SS SC
      - LT-SS AD
      - LT-SS CB
      - LT-SS CSC

Spin Develop System

Spin Cleaning System

   Track System
      - LT-AS Series
      - LT-AS MLC Track
      - LT-AS (Spin Wet System)

ITEM	LT-SS SD150	LT-SS SD200	LT-SS SD300
Substrate Size	Max 6" Wafer 100mm Square glass	Max 8" Wafer 150mm Square glass	Max 12" Wafer 200mm Square glass
Spin Motor	AC Servo Motor
Spin Speed	Max 5,000	Max 5,000	Max 3,000
Chuck	Aluminum / Acetal / Peek
Dispense Arm	In/Out : Stepping Motor, Up/Down : Cylinder or Motor
Cup (Bowl)	SUS or PP
Chemical Supply	Canister Tank에 의한 N2가압 / PVC Tank, Magnet Pump
Controller / Display	PC or PLC / 15" Monitor or 7" Color touch panel
Option	FFU / Chemical Tank내 Temp Control